Научно-технический
«ОПТИЧЕСКИЙ ЖУРНАЛ»
издается с 1931 года
Апрель 2014 № 4(81)
УДК 621.397

Analysis of Fabrication Tolerance Based on Uneven Thickness of Su8-photo-resist

Куинг Т. ., Фенггуанг Л. ., Йинхинг Ж. ., Бингченг М. ., Руи Ж. ., Дандан М. ., Хиаохинг П. ., Куианлианг Л. .

In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h e [0,3 mm] and a, b e [0,2 mm], light propagation performance does not affected. But, it is easy to actually fabricate EOPCB.
Ключевые слова: Spinning process, EOPCB, Polymer optical waveguide
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